氮摻雜之二氧化鈦（N-TiO2）薄膜之元素分析及
可見光催化反應活性的形成
楊天賜
慈濟技術學院通識中心副教授
摘要
本研究以反應式直流磁控濺鍍（Reactively direct-current magnetron sputtering）系統，
藉著改變通入濺鍍製程腔體的氮氣分率（fN2），來製備一系列不同的氮摻雜二氧化鈦
（N-TiO2）薄膜。通入氮氣於濺鍍電漿中，可將N 摻雜於氧化鈦（TiO2）薄膜中，隨著
氮氣分率（fN2）的增加，N 摻雜於TiO2 的量愈多。當fN2 從0 .25 增加到0.57 時，N 含
量從1.0 at.% 增加到1.4 at.%，雖然增加不多，但增加的大部份都是取代的N，這些取
代的N 愈多，可增加N-TiO2 薄膜的可見光吸收，光吸收陡升棱波長紅位移最多到520 nm
附近。這些增加的可見光吸收，將增加亞甲基藍可見光催化分解速率，即N-TiO2 薄膜中
具有較多取代的N，則具有較佳的光催化效率。當fN2 超過0.57 之後，N 含量快速增加，
在fN2 = 0.75 時，氮含量則增加到20.8 at.%，這些增加許多的N 含量，是因為氮化鈦（TiN）
的生成。從化學分析電子能譜（ESCA）之Ti2P 及N1S 的圖譜，可看出這種氮化鈦的N
與取代的N 不同，氮化鈦的生成，將會全吸收300~800 nm 的光，而變成不透光的黑色，
這種全吸收，並不會增加亞甲基藍可見光催化分解的反應速率，反而大大地降低其反應
速率，其反應速率常數比氧化鈦還低。N-TiO2 薄膜可當作可見光觸媒，是因具有取代的
N，N-TiO2 薄膜中具有較多取代的N，則具有較高的亞甲基藍可見光催化活性。當fN2 =
0.57 時，具有最高的亞甲基藍可見光催化反應活性，其一級反應速率常數為0.077 h-1。
關鍵字：反應式直流磁控濺鍍、二氧化鈦、氮摻雜二氧化鈦、氮化鈦、可見光觸媒、光
催化活性、薄膜
Elemental Analysis and Photocatalytic Activity of Nitrogen
Doped Titanium Oxide (N-TiO2) Films as Visible-light
Photocatalyst
Tien-Syh Yang
General Education Center, Tzu Chi College of Technology
Abstract
A series of nitrogen-doped titanium oxide (N-TiO2) films were prepared by a reactively
direct-current (DC) magnetron sputtering of titanium target in gas mixture of argon (Ar),
oxygen (O2) and nitrogen (N2) with various flow rates, respectively. The fraction of N2 in the
gas mixture influences some nitrogen species formed in the N-TiO2 films. As the fraction of
N2 (fN2) is increased from 0.25 to 0.57, about 1.0~1.4 at.% substitutional nitrogen, which
red-shifts the absorption edge of TiO2 maximum to 520 nm and exhibits visible-light induced
photocatalytic activity in the degradation of methylene blue (MB), are primarily produced in
the three films. However, the nitrogen content is increased plentifully to 20.8 at.% as the fN2
above 0.75 because of the formation of titanium nitride (TiN), which makes the film opaque
and diminish the photocatalytic activity largely. The best photocatalytic activity in the
degradation of MB under visible-light illumination with a 1st order rate-constant (k) about
0.077 hr-1 is obtained in the film with the largest substitutional N loading about 1.4 at.% at
fN2= 0.57
Keywords：Reactively direct-current (DC) magnetron sputtering; Titanium oxide;
Nitrogen-doped titanium oxide; Titanium nitride; Photocatalytic activity;
Visible-light photocatalyst; Film